| 英文摘要 |
Chromium nitride thin films have been widely applied in the molding industries to prolong the service life of coated components due to their excellent corrosion resistance and mechanical properties. The addition of silicon element into a Cr-N thin film could render a Cr-Si-N nanocomposite thin film with adequate mechanical properties. However, the corrosion resistance of Cr-Si-N thin films has not yet been studied thoroughly. In this work, the asymmetric bipolar pulsed DC reactive magnetron sputtering technique was adopted to deposit Cr-Si-N nanocomposite thin films with different silicon contents on SKD61 tool steel substrates. The corrosion resistance of each thin film was evaluated by a potentiostat in a 3.5 wt.% NaCl aqueous solution. Scanning electron microscopy and energy dispersive spectroscopy were employed to analyze the surface morphologies and chemical compositions of the corroded substrate surfaces. The influence of silicon content on the corrosion resistance of the thin films was investigated. It was observed that the corrosion resistance of the SKD61 tool steel substrate in the 3.5 wt.% NaCl aqueous solution was improved effectively due to the Cr-Si-N nanocomposite thin film. It is also noticed that the corrosion resistance of the Cr-Si-N nanocomposite thin film increased with increasing silicon content, which was attributed to the featureless microstructure of the high silicon containing thin film. A failure mechanism for the corroded thin film was also proposed in this study. |