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| 篇名 |
氮含量對AlCrTaTiZr高熵薄膜在0.1 M硫酸中腐蝕性質之影響
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| 並列篇名 |
The Effect of Nitrogen on the Corrosion Behavior of High Entropy Thin Films AlCrTaTiZr in 0.1M Sulfuric Acid |
| 作者 |
葉菁馥、林瑀宏、蔡銘洪、李健平、施漢章、葉均蔚 |
| 中文摘要 |
本研究探討於低碳鋼上DC濺鍍所得AlCrTaTiZr之高熵合金薄膜及其氮化膜之機械性質及抗蝕性。利用電子探針微量分析儀分析薄膜組成，藉由X光繞射和奈米壓痕儀得知薄膜之晶體結構及硬度，最後透過陽極極化曲線研究此薄膜在0.1 M的硫酸溶液中的腐蝕行為。 |
| 英文摘要 |
This study used DC sputtering to prepare thin films of high entropy AlCrTaTiZr alloy and nitride films and investigated their mechanical and anti-corrosion properties. The elemental compositions of the samples were characterized by electron probe x-ray microanalysis. The crystallographic phases and hardness of the thin films were studied by x-ray diffraction and nanoindenter. Finally, the corrosion behaviors of the films in 0.1 M sulfuric acid were studied using anodic polarization analyses. |
| 起訖頁 |
245-251 |
| 關鍵詞 |
高熵合金、高熵氮化膜、陽極極化曲線、硫酸溶液、High-entropy alloy、High-entropy nitride film、Anodic polarization curve、Sulfuric acid solution |
| 刊名 |
防蝕工程 |
| 期數 |
200912 (23:4期) |
| 出版單位 |
中華民國防蝕工程學會
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| 該期刊-上一篇 |
退火處理及類鑽薄膜對無電鍍鎳鍍層磨耗腐蝕之影響 |
| 該期刊-下一篇 |
奈米光觸媒被覆對高溫純水環境中304不銹鋼的防蝕效益研究 |
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