氮化鈦陶瓷硬質薄膜化學退鍍之特性研究

Characteristics of Stripping TiN Coating by Chemical Solution Method

本實驗主要研究以化學蝕刻技術去除金屬基材上之硬質薄膜，主要目的以改善工業鍍膜後不良率造成之附加成本。例如：高精密度之刀、工、模具重新被覆之價格昂貴。此研究主要去除氮化鈦（TiN）陶瓷薄膜，而在去除工業零件被覆硬質薄膜上仍必須使用化學蝕刻之技術。本研究首先利用陰極電弧沉積（Cathodic Arc Evaporation）之鍍層被覆技術，於M2工具鋼基材上沉積氮化鈦薄膜，再利用蝕刻溶液將氮化鈦陶瓷薄膜去除，蝕刻溶液為過氧化氫、氫氧化鈉和去離子水組成，在改變化學溶液組成與濃度下進行蝕刻，以求得最佳蝕刻條件。實驗結果顯示，鹼性過氧化氫水溶液為蝕刻主要因子，並由此研究提供最佳之溶液組成配方，以達到去除氮化鈦薄膜之應用，且在不損傷基材表面下完成。

Stripping hard coatings from metallic substrates is sometimes necessary for industrial tool components mainly due to cost consideration, for example, recoating expensive and precision molding tools or dies. This work focused on the characteristics of stripping TiN coatings, still an essential hard coating for most of the industrial parts, by using chemical dissolution solution method. The evaluation process was first started from TiN coating deposited on the M2 tool steel substrate by a cathodic arc evaporation process. Stripping of TiN coating was executed using solution comprised with hydrogen peroxide, sodium hydroxide and deionized water to investigate the stripping rate. The influences of concentration and prescription on etching conditions of removing TiN film were investigated as well. The results showed that stripping rates were strongly dependent on the concentration of H2O2 in alkaline solution and also affected by the crystal structure of TiN film. The aim of this study was to provide a formula solution for removing TiN film without damaging the substrate surface.