| 英文摘要 |
TiNi intermetallic compound is considered for its pseudoelasticity to the application of cavitation resistance. It is however expensive and motivated the introduction of thin film process. Cathodic arc plasma deposition was therefore used to deposit TiNi films on S48C medium carbon steel substrate to reveal the film composition and microstructure effect on the cavitation resistance, as well as electrochemical behavior in different environments. Experimental result shows that the film compositions were Ti45Ni55, Ti49Ni51 and Ti51Ni49 when target composition Ti50Ni50, Ti55Ni45 and Ti60Ni40 were used. Cavitation resistance of all coated specimens in fresh water were significantly increased. Whereas in 3.5 wt% NaCl solution and 3.5 wt% HCl solution, the cavitation weight loss of specimen is higher than the specimen in fresh water. In fresh water, the films with different compositions almost have the same weight loss. Film composition does not influence the cavitation resistance of films in this regard. It however causes the difference in weight loss of specimens by suffering the electrochemical reactions that occurs in NaCl solution and HCl solution. Ti-rich film composition may reduce Icorr and give rise to Epp of specimens in 3.5wt% NaCl solution, or reduce Icorr of specimens in 3.5wt% HCl solution. This explains that the films prepared by using Ti60Ni40 and Ti55Ni45 target have superior cavitation resistance. |