電解析出錫薄膜的應用研究

Application and Study of Electrodeposited Tinfilm

錫金屬因本身具耐腐蝕特性，且在13-20℃間會由低溫四配位鑽石立方結構（α-Tin）變化為高溫六配位體心正方晶結構（β-Tin），並對溫度變化有極高的敏感性，很適合應用於大氣腐蝕現場作為室溫下的溫度感測及大氣接觸腐蝕現象的量測。本實驗室為瞭解錫電解析出沈積膜中，組成與電性的變化情形，故對以電化學方式在銅基材及炭鋼基材沉積之錫金屬薄膜作XRD及Rietveld精算分析法，確定alfa-Tin與beta-Tin的生成比率，配合其電性隨溫度的變化情形以確定其變態溫度，並瞭解各相在錫薄膜電性中所扮演的角色，至於錫薄膜的電解析出條件則可以高斯法分析而規範之，且在解析整理中可推算電解析出條件的最適點其所表現的最佳相變態行為。

Tin metal have durability of corrosion. At 13~20℃, α-Tin (tetrahedral; diamond structure) is changed to β-Tin (hexahedral; bcc). It is very sensitively for the change of the temperature. It is suitable for the measuration of temperature at room temperature and corrosion in atmosphere. We try to understand the compositions and properties of eletricity of the film of electrodeposition. The layer of tin-film on copper and steelsubstrate by electrochemical method is investigated by XRD and Rietveld analysis to determine the appearance of structure transform temperature and understand role of alfa-Tin and beta-Tin in properties of electricity. The condition of electodeposition of tin-film is analyzed by Gauss method. Then we can find the most apposite condition of electrodeposition.