氧化釔－氧化鎂奈米複合薄膜微結構特性、機械性質與蝕刻行為之研究

Microstructural Characterization, Mechanical Properties, and Erosion Behavior of Y2O3–MgO Nanocomposite Films

本研究探討氧化釔（Y2O3）：氧化鎂（MgO）比例對Y2O3–MgO（YM）奈米複合薄膜之微結構、機械性質與電漿蝕刻行為的影響。隨著MgO含量的增加，YM複合薄膜的柱狀晶成長結構受到破壞，導致Y2O3晶粒細化。當Y2O3：MgO體積比為40:60時，由於Y2O3與MgO之間的熱力學不相容性，YM複合薄膜的柱狀晶結構能被有效細化。因此，YM複合薄膜的機械性質顯著提升，其最高硬度與彈性模數分別為16.84±0.7與151.57±3.5GPa。X射線光電子能譜（XPS）分析顯示，YM複合薄膜在氟化後，其表面層的元素與化學組成僅有極小變化，證實YM複合樣品具有良好化學穩定性。此外，含有60% MgO的YM複合薄膜，其蝕刻速率僅約為商用Y2O3薄膜的一半。研究結果表明，經強化的YM複合薄膜具有比Y2O3薄膜更優異的抗蝕刻性能。

This study examined the effects of Y2O3:MgO volume ratio on the microstructures, mechanical properties, and plasma erosion behaviors of Y2O3–MgO(YM) nanocomposite films. The columnar growth structure of the YM film was gradually disrupted as the MgO content increased, resulting in the refinement of Y2O3grains. When the Y2O3:MgO volume ratio was 40:60, the columnar structure of the YM nanocomposite film was effectively refined because of the thermodynamic incompatibility of Y2O3and MgO. Consequently, this film exhibited high maximum hardness and elastic modulus values of 16.84±0.7and 151.57±3.5GPa,respectively. X-ray photoelectron spectroscopy revealed that the elemental and chemical compositions of the surface layer of the YM film did change notably following fluorination, confirming the chemical stability of the film. The etching depth on a YM film with a MgO content of 60%was approximately 105%smaller than that on a commercial Y2O3film(0% MgO),indicating the higher erosion resistance of the strengthened YM nanocomposite film.