以飛秒雷射還原法製備還原態石墨烯

Preparation of Reduced Graphene Oxide by Femtosecond Laser Reduction

本研究探討以飛秒雷射 （femtosecond laser） 一步驟於無還原劑的氧化石墨烯 （graphene oxide, GO） 水溶液中直接將GO 還原形成還原態石墨烯（reduced graphene oxide, RGO）。再分別利用紫外光可見光分光光譜儀 （UV/visspectrophotometer, UV/vis）、顯微拉曼光譜儀 （micro-Raman spectrometer）、X 光繞射分析儀 （X-ray diffractometry, XRD）、X 光光電子能譜儀 （X-ray photoelectronspectroscopy, XPS） 和原子力顯微鏡 （atomic force microscopy, AFM） 探討GO 和RGO 還原前後的結構組成、元素分析和表面形貌變化。最後以飛秒雷射製備的RGO 與熱還原法和化學還原法製備的RGO 進行比較，證實經飛秒雷射能有效還原GO。

In this paper, a femtosecond laser was used to reduce GO to RGO inan aqueous solution without using reducing agents. The method of preparationof RGO was characterized by UV/vis spectrophotometer (UV/vis),micro-Raman spectrometer, X-ray diffraction (XRD), X-ray photoelectronspectroscopy (XPS), and atomic force microscopy (AFM). Comparedwith chemically reduced graphene oxide and thermally reduced grapheneoxide, the reduced graphene oxide prepared by the femtosecond lasershowed excellent properties.