以氣相層析質譜法偵測半導體廠作業環境空氣中有害物

Probing Airborne Chemicals of Semiconductor Work Place Using Gas Chromatography Mass Spectrometry

半導體積體電路製造廠原物料化㈻品及副產物逸散於作業環境中不僅可能會危害勞工健康， 亦會污染晶圓降低產品良率。本研究以不鏽鋼筒採樣、氣相層析質譜儀分析方法及可移動式自動採樣氣相層析質譜法， 針對某半導體廠之作業環境、機台定期保養維修、機台尾氣管線與處理設備， 進行採樣分析及現場連續量測，以了解逸散物濃度及來源， 並作為安全衛生防護應變之參考。結果顯示， 於正常狀況下清淨室內污染物種類多而濃度大部分少於ppm，而主要污染物為Isopropanol及Acetone， 其濃度部分高於1ppm。蝕刻區可能由於機台經常進行維修保養，其總碳氫化合物濃度高於其他製程區。苯、2-Methoxy-2-methylpropane則主要來自於室外交通工具之廢氣。金屬蝕刻機預防保養時，有時會逸散高於勞工㈰時量平均容許濃度之副產物HCN、CNCl，另也會逸散致癌性之Chloroform與CCl4等化合物，作業人員需特別注意暴露防護之工作。

Semiconductor integrated circuit manufacturing processes utilize and generate numerous hazardous chemicals. Emission of those chemicals may affect worker’s health and /or causes wafer defect. Canister GC/MS method and a transportable auto-sampling GC/MS were utilized to investigate the airborne chemicals and by-products of work place, tool maintenance process and effluent; of treatment devices in a semiconductor factory. Most of airborne chemicals are at sub-ppm concentration levels during normal operations in the clean room. Isopropanol and acetone are the major volatile organics, and they may reach over ppm level. Frequent tool’s maintenance might result that the total hydrocarbon concentration of etching area was higher than other process area in this study. Meanwhile, airborne benzene and 2- methoxy-2-methylpropane of cleanroom were mainly contributed by the outdoor vehicular effluents. Hydrogen cyanide and chlorocyanide , the by products of plasma clean process, were found over permissible exposure levels during preventive maintenance of some metal etchers. While, carcinogenical compounds of chloroform and tetrachloromethane were also found. Thereforce necessary protective measurements should be enforced to reduce worker’s exposures for such preventive maintenance process.