以陰極電弧沉積氮氧化鋁鈦薄膜之結構與特性分析

Structures and Properties of AlTiON Coatings Synthesized by Cathodic Arc Deposition Process

To further improve wear resistance of AlTiN coatings for dry cutting applications, the development of AlTiON coatings by cathodic arc deposition was investigated. The AlTiON coatings in combination of AlTiN/CrN multilayered coating were investigated with using Al0.67Ti0.33 and Cr targets at various O2 and N2 gas ratios in this study. The structure of the various AlTiON coatings as surface layers was explored using scanning electron microscopy, x-ray diffraction (XRD), and x-ray photoelectron spectroscopy. The XRD analyses showed that the AlTiON films had NaCl-type structure which is similar to the AlTiN film. The effect of oxygen content on the AlTiON films results in increased hardness and roughness with respect to the AlTiN as the oxygen flow increase. Wear tests show that the AlTiON specimen deposited at the highest oxygen flow exhibits a lower coefficient of friction and wear rate compared to that of the AlTiN film. For the coating with higher amount of oxygen, the hardness and oxide phase may play a major role to improve the wear behavior in this study. Compared to AlTiN, the corrosion resistance of the AlTiON coated specimen is significantly improved by incorporating hisher oxygen content into the coating. The thermal test reveals the best oxidation resistance for the AlTiON specimen with the highest oxygen content. The AlTiON coating with the best properties was performed at an oxygen flows of 30 sccm while the nitrogen flow kept at 320 sccm.為了進一步改善氮化鋁鈦薄膜之乾式切削之工業應用，本研究採取陰極電弧沉積氮氧化鋁鈦薄膜作為改善之研究標的。氮氧化鋁鈦薄膜之結構為結合氮氧化鋁鈦表面層及氮化鋁鈦／氮化鉻多層膜，並以Al0.67Ti0.33和Cr為固態靶材，製程通入不同氧、氮氣比例作為反應性氣體。薄膜之結構性質分析儀器包括X－光繞射儀、掃描式電子顯微鏡和X－光電子質譜儀。X－光繞射儀分析得到氮氧化鋁鈦薄膜之結構為典型之氯化鈉陶瓷結構形式，且與氮化鋁鈦薄膜之結構近似。相對於氮化鋁鈦薄膜，隨著氧元素之增加薄膜硬度和粗度亦隨之增加。由磨耗模擬實驗知隨著氧元素之增加可以使氮氧化鋁鈦薄膜之摩擦係數和耐磨耗性獲得改善。與氮化鋁鈦薄膜比較耐腐蝕性知，隨著氧元素之增加可以改善薄膜在硫酸環境中之耐腐蝕性。熱重氧化分析知最佳耐氧化之薄膜為加入最多氧元素之氮化鋁鈦薄膜。因此，本研究所得到之最佳化氮氧化鋁鈦薄膜之製程條件是在氧流量為30sccm和氮氣流量為320sccm條件下得到。