數值模擬製程參數對氣/液/固法生長奈米結構演化之影響

Numerical study on the effects of processing parameters on nanostructure evolution grown by vapor-liquid-solid method

氣/液/固法製程具有設備簡單、大高寬比、缺陷少等特性，因而常用於半導體製程與微機電系統元件的製備。為闡述氣/液/固法製程技術原理，展現其優點與特性，本研究以數值模擬技術建立氣/液/固法之相場模型(phase field model)，重建基材表面之金屬催化劑受到反應氣體作用，奈米線生長之結構隨時間演化的過程。考量在材料晶體系統異向性與金屬催化劑於週期性排列情況下，透過改變不同製程參數，如過飽和度、成核速率參數等，探討其製程參數對微結構生長之影響，同時依據數值模擬結果進行定量分析。本研究結果有助於對氣/液/固法生長奈米線之形貌結構演化過程有更深的了解，並提供氣/液/固製程技術開發方向的參考。

 

Due to the features of simple equipment setup, high aspect ratio, and minimal defects, the vapor/liquid/solid process is widely used in the semiconductor processing and the fabrications of microelectromechanical system components. To thoroughly comprehend this technique, in this study a phase field model of a vapor/liquid/solid method is established to numerically rebuild the formation and evolution of surface morphologies during a deposition process. With the conditions of the anisotropy for a crystal system and the periodic arrangement of metal catalysts, different process parameters, such as supersaturation and nucleation rate, are considered to investigate their influence on the surface morphologies. In addition, the quantitative analysis of the surface morphologies for the simulation calculations are also implemented. The results of this study would help to better understand the principles of the surface morphology and evolution of nanostructures grown by the vapor/liquid/solid method, and provide a guidance for the development of a vapor/liquid/solid process.