五氧化二鉭光學薄膜微觀結構與沉積能量之關係

現今使用光學鍍膜技術廣泛，包含電子槍蒸鍍、離子輔助鍍膜、反應磁控濺鍍、離子束濺鍍等製程，本文將使用不同之薄膜沉積技術製鍍五氧化二鉭（Ta2O5）光學薄膜，並從薄膜之微觀結構、薄膜表面粒徑、光學折射率表現，與加溫後折射率熱飄移現象作一比較，證明製程技術不同，所帶有薄膜沉積能量將有差異，此舉必影響薄膜微觀結構與宏觀行為的表現。

Optical thin film properties are related to the thin film's real microstructure, directly. Today, Many physical vapor deposition (PVD) techniques are used in optical thin film coating. In this paper we prepared Ta2O5 thin film by several important energetic PVD processes, evaporation, ion assisted deposition, magnetron reactive sputtering, and ion beam sputtering, respectively. The Ta2O5 surface morphology was studied using scanning electron microscopic (SEM) and surface particle size distribution were analyzed with image analysis system. In contrast to film growth are substantially influenced by the energy of arriving species at the B270 substrate glass. Especially the ion assisting species, the popular tools of increasing film package density, and controlled bombard the growing films during deposition.