連續生產型超高頻電漿增強式鍍膜設備設計及其性能探討

Design and Performance of Continuous Production Type VHF Plasma Enhanced Coating Equipment

電漿增強式化學氣相沈積裝置（PECVD）為光電半導體產業中，極關鍵之製程設備，該設備的量產型態最佳方案一直是業界持續關注並投入之研究項目。其中連續生產型（In-line type）是高性價比之量產方案，尤其可對應於需求高產能的太陽光電產業，特別是異質鍍膜的量產製程，例如高效率的矽晶異質接面太陽能電池結構。本文將就連續生產型PECVD設備之設計流程與關鍵技術內容進行介紹，從設備架構的選用考量，乃至其中的關鍵模組包含加熱系統、射頻系統、流體結構建構進行說明。設備開發過程中以射頻電磁場、熱流體分析等技術為主體，搭配量測儀器的協助使用，解構PECVD設備中射頻能量的行為，對設備效能之影響，如電漿分布均勻性的各種設計考量。對於需求高穩定性、高產能之量產型PECVD設備業者而言，能夠提供其相關設備之自主化生產方案。 Plasma enhanced chemical vapor deposition(PECVD) for the optoelectronic semiconductor industry, the most critical of the process equipment, the production of the best mode of equipment has been the industry continued attention and investment projects. Among them, the continuous production(In-line type) is a cost-effective production program, in particular, can correspond to the demand for high-capacity solar photovoltaic industry, especially heterogeneous coating production process, such as high effi ciency silicon dioxide hetero surface solar cells structure. In this paper, the design process and key technical contents of continuous production PECVD equipment are introduced. The selection of equipment structure and even the key modules include the heating system, radio frequency system and fl uid structure construction. Equipment development process to radio frequency electromagnetic field, hot fluid analysis and other technologies as the main body, with the use of measuring instruments to assist the use of deconstruction of PECVD equipment in the RF energy behavior, the impact of equipment performance, such as plasma distribution uniformity of various design considerations. For the needs of high stability, high production capacity of the production PECVD equipment industry, to provide its own equipment, independent production program.