中國專利質量報告－－實用新型與外觀設計專利制度實施情況研究

On the Patent Quality：A Special Report about the Implementation of Utility Mode and Industrial Design Patent

專利質量問題是關涉到專利制度能否實現其初始目標價值的核心關鍵問題。專利制度建立以來，關於專利質量的問題，有過兩次大規模的爭論。第一次是發生在上世紀末的美國，第二次是處於高速發展中的中國。中國專利制度建立30年來，獲得了巨大的發展。近年來，我國專利申請數量快速增長，但專利的質量卻受到廣泛詬病，尤其是實用新型和外觀設計專利的質量問題。這可以從專利質量的界定、產生專利質量問題的根源、專利質量問題的國情背景、實用新型與外觀設計專利制度的國際視野等角度來考察，並進一步探索我國應當採取的應對之道。

Patent quality is the critical problem concerned with whether patent system can operate well or not. There’re two time’s large scale debates over this problem in the world since the establishment of patent system. Once was in the U.S.A., at the end of last century, and the another one is in the present China with high speed of development. Recently, with the patent explosion in China, the patent quality, especially the utility mode and industrial design, is critiqued severely by many scholars. This report, tackles this problem from different perspectives, such as the deifnition of patent quality, the causations of the problem, and etc, and tries to ifnd out the suitable solution.