穿透式電子顯微鏡應用於奈米孔洞形貌控制製程

A Shaped-controlled Fabrication of Nanopores with Transmission Electron Microscope

使用穿透式電子顯微鏡的高強度(107-108Am-2)電子束作為樣品觀測外，亦能用於奈米孔洞的製程，並且可以達到製程中實時的觀察與精確的尺寸控制。但高強度的電子束對於孔洞側壁的形成無法有良好的控制與掌握，在本文中，我們展示了使用低強度的電子束在氮化矽薄膜上製作奈米孔洞的技術。並且，可以對於孔洞尺寸擁有精準控制以及對其建構三維模型。奈米孔洞三維模型是基於電子斷層掃描技術，將一系列的傾斜影像使用權重背向投影法進行重建，建構其三維模型。並且在不同電子束鑽孔條件下，研究奈米孔洞的側壁形貌，根據其結果闡明了孔洞形成的機制。

The high-intensity (107-108Am-2) electron beam of the transmission electron microscope can be used for sample observation and also for the fabrication of nanopores. It could achieve real-time observation of nanopores and precise size control during the fabrication process. However, high-intensity electron beams cannot control the formation of the pore's sidewall. In this study, we demonstrate the technique of using low-intensity electron beams to fabricate nanopores on silicon nitride membranes. As a result, it is possible to have precise control over the size of the pores and 3D model construction. The 3D model of nanopores is based on electron tomography technology, and a series of oblique images are reconstructed using the weighted back projection method to construct a 3D model. And under different electron beam drilling conditions, the sidewall morphology of nanopores was studied, and the mechanism of pore formation was noted according to the results.