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篇名
The Influence of Growth Temperature on InAs/GaAs Quantum Dots
作者 黃俊元歐子銘張文騰吳孟奇沈政忠梁秋月林時彥祁錦雲
英文摘要
For InAs quantum dots (QDs) grown on GaAs by molecular-beam epitaxy (MBE), we demonstrate the surface morphology and optical characteristics of dots formed under different growth temperatures of 480, 500, 520 °C. From the atomic force microscopy (AFM) results, all sample exhibited two-group size distributions which are attributed to the QDs coalescence resulting from the slow cooling procedure after quantum-dot growth (~15 °C/min.). Simultaneously, the decrease of dots density with increasing growth temperature is attributed to the enhancement of In adatom migration length at higher growth temperature. The observation of higher-order excited state luminescence for QDs grown at 500 °C has indicated a high carrier lifetime for the photo-excited electrons. From PL results of sample B, 500 °C is the optimum growth temperature for InAs/GaAs QDs.
起訖頁 59-62
刊名 真空科技  
期數 200512 (18:3期)
出版單位 台灣真空學會(原:中華民國真空科技學會)
該期刊-上一篇 Photoluminescence Spectral Features of CdTe on InSb Grown by Molecular Beam Epitaxy
該期刊-下一篇 Effects of Dot-height Uniformity on the Performance of 1.3 µm InAs Quantum Dot Lasers
 

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