真空製程壓力與環測溫度對HfO2/SiO2光學薄膜的影響

探討不同真空製程壓力環境影響下，製程壓力對HfO2和SiO2薄膜濺鍍速率的影響以及在300-400 nm紫外光波段之薄膜光學性質與表面微結構之差異，並製鍍單、雙介面抗反射膜，探討不同環測溫度條件薄膜穿透率之差異性。

The effect of vacuum pressure on HfO2 / SiO2 thin films deposition rate optical properties in 300 ~ 400 nm UV region and surface microstructure were discussed. We can research different temperature in environment test for coating one side/double sides anti-reflection.