真空製鍍氟化鑭光學薄膜輔以離子助鍍之研究

本實驗使用熱阻舟蒸鍍氟化鑭光學薄膜，在低溫下（150°C）配合使用離子輔助蒸鍍技術，研究不同的離子輔助鍍膜參數，藉由成膜後氟化鑭薄膜的穿透率、折射率、消光係數以及表面微觀結構等，所獲得的資訊，找出了合適的鍍膜參數，達到改善氟化鑭膜質的目的。

Lanthanum fluoride (LaF3) optical thin film prepared by resistive heater at low temperature (150°C) has been investigated. The working parameter of ion source in the ion-assisted process strongly influences the transmittance, refractive index (n), extinction coefficient (k) and surface morphology of the deposited film. The optimum parameter for the coating processes to improve the thin film quality has been described.