英文摘要 |
With the rapid development of the semiconductor industry, the progress of transistor miniaturization is made rapidly. Even though the physical limits are approaching, major research teams are still diligently exploring various possibilities. However, memory technology is not as good at miniaturization as it should be, so there is a demand for new memory, one of which is magneto-resistive random access memory (MRAM). MRAM has non-volatile properties, with fast read/write speed, and high overwriting frequency. These merits make it a promising candidate for next-generation memory technology. However, there are considerable challenges in MRAM in terms of the fabrication process. In this report, we explore the development and bottlenecks of this technology, first from the perspective of spin-transfer torque (STT) MRAM. We then extend to the spin-orbit torque (SOT) MRAM, which is a very popular research topic of the technology. |