低溫電漿輔助原子層沈積鍍製光觸媒使用之白金奈米薄膜

Low Temperatures Process of Inductively Coupled Plasma-Enhanced Atomic Layer Deposition for Fabricating Platinum Nano Thin Films as Photocatalyst

低溫電漿輔助原子層沈積製程鍍製光觸媒使用之白金奈米薄膜，具有良好的化學與溫度穩定性，可用於製作旋轉床式反應器中所使用的具有白金奈米薄膜反應床。低溫電漿輔助原子層沈積製程可鍍製單一晶相之奈米薄膜，經由XPS與XRD之量測結果，可知道鍍製的奈米薄膜具備有清楚的4f軌域訊號（74.3 eV(4f5/2) and 71.1 eV(4f7/2)），以及（111）的fcc晶相組成結構。8奈米以上的白金薄膜具有小於12 m W的導電阻抗。在鍍製奈米白金薄膜旋轉床的使用中，可在照光下強化以白金為觸媒之相關化學反應進行，對於相關的應用研究具有重要意義。 The inductively coupled plasma-enhanced atomic layer deposition(PEALD) method was used to fabricate nano Pt thin films at low temperatures with good thermal and chemical stability. The Pt thin metal films deposited on circular glass disk by PEALD can be used as reaction disk in the photocatalytic spinning disk reactor. The deposited Pt thin film has clear 4f peaks(74.3 eV(4f5/2) and 71.1 eV(4f7/2) ) in X-ray photoelectron spectra measurements. The X-ray diffraction measurements showed the(111) peak of the fcc structure. The deposited Pt thin film has electric sheet resistance smaller than 12 m W cm for films with a thickness greater than 8 nm. The PEALD-deposited Pt thin films were chemically stable under high-temperature light illumination and could serve as catalysts under strongly alkaline conditions(pH = 12) during the long-term oxidization of ammonium ions.