佈植後退火之奈米粒子成核成長特性研究

Characterization of the Nucleation and Growth of Nanoparticles by Post-implantation Annealing

奈米粒子擁有獨特的化學與物理特性，被廣泛地應用在各領域之中。本研究以相場法（Phase Field Method）所建立之理論模型與數值模擬方法，可探討經離子佈植後的退火過程，基材中等向性奈米粒子的形成與演化機制，其中包含奈米粒子隨時間增加其析出相變之成核、成長與奧氏熟化（Ostwald ripening）的過程。結合Monte Carlo TRIM離子佈植的模擬計算，分析不同製程條件參數下，如佈植離子劑量、離子能量和退火製程溫度等，對奈米粒子微觀結構之演化與成核成長動力學特性的影響。本理論模型提供不同佈植參數和材料特性的模擬結果，預測經佈植後退火奈米粒子之成核成長與演化特性。可用以發展具特殊形貌與應用價值之奈米結構材料，增加佈植退火製程在奈米技術中的應用性。

Nano-scale materials, such as nanoparticles, are widely applied in various high-potential techniques due to their unique chemical and physical properties. In this study, a phase field model and numerical simulations were applied to reconstruct the formation and evolutions of nanoparticles, e.g. the nucleation and growth process, including Ostwald ripening, induced by post-implantation annealing. Integrating with this theoretical model and Monte-Carlo TRIM calculation, the effects of the implantation parameters, such as ion dose, ion energy and annealing temperature, on the nucleation and growth kinetics of nanoparticles were also investigated. This study provides various simulation results with different implantation parameters and material properties, which well characterizes the evolutions and behaviors for the nucleation and growth of the nanoparticles during post-implantation annealing. That is useful to develop the unique and valuable nanostructured materials, and further facilitates the technological utilizations of post-implantation annealing process.