避免專利侵害之策略－－迴避設計

Strategy for Avoiding Patent Infringement –“Design Around”

本研究探討專利迴避設計的核心概念。由實務設計的角度探討專利迴避設計、專利侵害鑑定方法、迴避設計原則等。當企業欲進行專利迴避設計時，若將產品以原專利直接進行抄襲，會符合全要件原則，而被判定為文義侵害。但若將設計元件部份刪除或改變，即能避免落入全要件原則。企業若可善用侵權理論進行迴避設計，將可有效避免專利訴訟。並可因此產生新的專利權，藉以減少全新研發所需投入的龐大資源。

This research investigates the core concepts of “design around”. It explores three inter-related topics: design around, ways to identify patent infringement, and the principles of design around from the aspect of practical designing. If enterprises want to start design around and produce their products by copying the original patent directly, their behavior may violate element rules and so be judged as literal infringement. However, by partially deleting or changing some designing elements, this problem can be avoided. If enterprises can make good use of theory of infringement to conduct design around, they can effectively avoid patent proceeding, and therefore produce a new patent right that helps decrease expending the immense resources required by a new research and development program.