Effect of Oxygen on the Characteristics of ZnGa2O4 Thin Film Grown by Radio Frequency Magnetron Sputtering

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篇名	Effect of Oxygen on the Characteristics of ZnGa2O4 Thin Film Grown by Radio Frequency Magnetron Sputtering
並列篇名	氧氣氛對氧化鋅鎵薄膜之特性影響
作者	余昌峰
中文摘要	The characteristic of the ZnGA2O4 thin films were influenced by the percentage of oxygen during RF sputtering.
起訖頁	295-302
關鍵詞	氧氣氛、氧化鋅鎵薄膜、ZnGA2O4、RF sputtering、cathodoluminescent and indirect band gap
刊名	朝陽學報
期數	200206 (7:2期)
出版單位	朝陽科技大學
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