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篇名
Preparation and Characterization of Nanostructures Using Scanning Probe Discharge Lithography
作者 Yu-Fen Chen (Yu-Fen Chen)Shao-Hui Kang (Shao-Hui Kang)Te-Hua Fang (Te-Hua Fang)Zheng-Han Hong (Zheng-Han Hong)
中文摘要
The demand for more precisely controlled mechanical methods for semiconductor materials growth continuous to increase. The practicality of the proposed method is demonstrated using discharge nanoprocessing with a probe tip. A scanning probe microscope (SPM) comprising a tip, a lithography controller, and a power supply is used to demonstrate the proposed concept. The results show that increasing the discharging time results in a higher pit. A general view of the discharge processing in ZnO film reveals the skin effect. Semi-contact and contact mode lithography discharge collected pits average 2~11nA. The largest oxide nanowire corresponded to the longest oxidation time.
起訖頁 33-37
關鍵詞 ZnONanolithographyScanning Probe MicroscopyDischarge.
刊名 Journal of Science and Innovation  
期數 201101 (1:1期)
出版單位 臺灣知識創新學會
該期刊-上一篇 Surface Morphology and Liquid Sensor Sensitivity of Barium-Doped ZnO Thin Film
 

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