Preparation and Characterization of Nanostructures Using Scanning Probe Discharge Lithography

The demand for more precisely controlled mechanical methods for semiconductor materials growth continuous to increase. The practicality of the proposed method is demonstrated using discharge nanoprocessing with a probe tip. A scanning probe microscope (SPM) comprising a tip, a lithography controller, and a power supply is used to demonstrate the proposed concept. The results show that increasing the discharging time results in a higher pit. A general view of the discharge processing in ZnO film reveals the skin effect. Semi-contact and contact mode lithography discharge collected pits average 2~11nA. The largest oxide nanowire corresponded to the longest oxidation time.